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2017 ; 7
(ä): 40087
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Patterned transparent electrode with a continuous distribution of silver
nanowires produced by an etching-free patterning method
#MMPMID28198798
Shin K
; Park JS
; Han JH
; Choi Y
; Chung DS
; Kim SH
Sci Rep
2017[Feb]; 7
(ä): 40087
PMID28198798
show ga
The outstanding electrical, optical, and mechanical properties of silver nanowire
transparent electrodes are attractive for use in many optoelectronic devices, and
the recent developments related to these electrodes have led to their
commercialization. To more fully utilize the advantages of this technology,
developing new process technologies in addition to performance improvements is
important. In this report, we propose a novel ultra-simple patterning technology
to generate a silver nanowire transparent layer and a unique patterned structure
with continuously distributed silver nanowires without any etched areas. The
patterning is conducted by exposure to ultraviolet light and rinsing. The exposed
and unexposed regions of the resulting layer have dramatically different
electrical conductivities, which produces an electrical pathway without using any
etching or lift-off processes. The unique patterned structure produced by this
etching-free method creates hardly any optical difference between the two regions
and results in excellent visibility of the patterned transparent electrode layer.