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10.1038/srep13023 http://scihub22266oqcxt.onion/10.1038/srep13023 C4542686!4542686 !26268896     free     free     free Warning: file_get_contents(https://eutils.ncbi.nlm.nih.gov/entrez/eutils/elink.fcgi?dbfrom=pubmed&id=26268896 &cmd=llinks): Failed to open stream: HTTP request failed! 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Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching |pdf=|usr=}}{{26268896 }} gab.com Text Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching JO: Sci Rep http://www.kidney.de/pget.php?&tw=1&pmid=26268896 #FOAvip Fused silica subwavelength structures (SWSs) with an average period of ~100?nm were fabricated using an efficient approach based on one-step self-masking reactive ion etching. The subwavelength structures exhibited excellent broadband antireflection properties from the ultraviolet to near-infrared wavelength range. These properties are attributable to the graded refractive index for the transition from air to the fused silica substrate that is produced by the ideal nanocone subwavelength structures. The transmittance in the 400-700?nm range increased from approximately 93% for the polished fused silica to greater than 99% for the subwavelength structure layer on fused silica. Achieving broadband antireflection in the visible and near-infrared wavelength range by appropriate matching of the SWS heights on the front and back sides of the fused silica is a novel strategy. The measured antireflection properties are consistent with the results of theoretical analysis using a finite-difference time-domain (FDTD) method. This method is also applicable to diffraction grating fabrication. Moreover, the surface of the subwavelength structures exhibits significant superhydrophilic properties. Twit Text FOAVip Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching ????Sci Rep http://www.kidney.de/pget.php?&tw=1&pmid=26268896 #FOAvip Twit Text # Free Paper on # # # # # LINK http://www.kidney.de/pget.php?&tw=1&pmid=26268896 #FOAvip English Wikipedia <ref>{{Cite pmid|26268896 }}</ref> Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using one-step self-masking reactive ion etching #MMPMID26268896 Ye X ; Jiang X ; Huang J ; Geng F ; Sun L ; Zu X ; Wu W ; Zheng W Sci Rep 2015[Aug]; 5 (ä): 13023 PMID26268896 show ga Fused silica subwavelength structures (SWSs) with an average period of ~100?nm were fabricated using an efficient approach based on one-step self-masking reactive ion etching. The subwavelength structures exhibited excellent broadband antireflection properties from the ultraviolet to near-infrared wavelength range. These properties are attributable to the graded refractive index for the transition from air to the fused silica substrate that is produced by the ideal nanocone subwavelength structures. The transmittance in the 400-700?nm range increased from approximately 93% for the polished fused silica to greater than 99% for the subwavelength structure layer on fused silica. Achieving broadband antireflection in the visible and near-infrared wavelength range by appropriate matching of the SWS heights on the front and back sides of the fused silica is a novel strategy. The measured antireflection properties are consistent with the results of theoretical analysis using a finite-difference time-domain (FDTD) method. This method is also applicable to diffraction grating fabrication. Moreover, the surface of the subwavelength structures exhibits significant superhydrophilic properties. äFormation of broadband antireflective and superhydrophilic subwaveleng(epmc).pdf DeepDyve Pubget Overpricing