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10.1186/s11671-015-0976-2

http://scihub22266oqcxt.onion/10.1186/s11671-015-0976-2
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C4499035!4499035!26163138
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suck abstract from ncbi


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pmid26163138      Nanoscale+Res+Lett 2015 ; 10 (ä): ä
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  • Uniformly Nanopatterned Graphene Field-Effect Transistors with Enhanced Properties #MMPMID26163138
  • Choi D; Kuru C; Kim Y; Kim G; Kim T; Chen R; Jin S
  • Nanoscale Res Lett 2015[]; 10 (ä): ä PMID26163138show ga
  • We have successfully fabricated and characterized highly uniform nanopatterned graphene (NPG). Thin anodized aluminum oxide nanomask was prepared by facile self-assembly technique without using polymer buffer layer, which was utilized as a direct-contact template for oxygen plasma etch to produce near-periodic, small-neck-width NPG. The NPG exhibits a homogeneous mesh structure with an average neck width as small as ~11 nm. The highly uniform 11-nm neck width creates a quantum confinement in NPG, which has led to a record bandgap opening of ~200 meV in graphene for the given level of neck width. Electronic characterization of single-layer NPG field-effect transistors (FETs) was performed, which demonstrated a high on-off switching ratio. We found that the NPG allows for experimental confirmation of the relationship between electrical conductance and bandgap. This work also demonstrates that our direct-contact, self-assembled mask lithography is a pathway for low-cost, high-throughput, large-scale nanomanufacturing of graphene nanodevices.
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