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2017 ; 7
(1
): 9085
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Microchannel contacting of crystalline silicon solar cells
#MMPMID28831077
Bullock J
; Ota H
; Wang H
; Xu Z
; Hettick M
; Yan D
; Samundsett C
; Wan Y
; Essig S
; Morales-Masis M
; Cuevas A
; Javey A
Sci Rep
2017[Aug]; 7
(1
): 9085
PMID28831077
show ga
There is tremendous interest in reducing losses caused by the metal contacts in
silicon photovoltaics, particularly the optical and resistive losses of the front
metal grid. One commonly sought-after goal is the creation of high aspect-ratio
metal fingers which provide an optically narrow and low resistance pathway to the
external circuit. Currently, the most widely used metal contact deposition
techniques are limited to widths and aspect-ratios of ~40 ?m and ~0.5,
respectively. In this study, we introduce the use of a micropatterned
polydimethylsiloxane encapsulation layer to form narrow (~20 ?m) microchannels,
with aspect-ratios up to 8, on the surface of solar cells. We demonstrate that
low temperature metal pastes, electroless plating and atomic layer deposition can
all be used within the microchannels. Further, we fabricate proof-of-concept
structures including simple planar silicon heterojunction and homojunction solar
cells. While preliminary in both design and efficiency, these results demonstrate
the potential of this approach and its compatibility with current solar cell
architectures.