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2015 ; 8
(12
): 8661-8673
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A Photolithographic Approach to Polymeric Microneedles Array Fabrication
#MMPMID28793736
Dardano P
; Caliò A
; Di Palma V
; Bevilacqua MF
; Di Matteo A
; De Stefano L
Materials (Basel)
2015[Dec]; 8
(12
): 8661-8673
PMID28793736
show ga
In this work, two procedures for fabrication of polymeric microneedles based on
direct photolithography, without any etching or molding process, are reported.
Polyethylene glycol (average molecular weight 250 Da), casted into a silicone
vessel and exposed to ultraviolet light (365 nm) through a mask, cross-links when
added by a commercial photocatalyzer. By changing the position of the
microneedles support with respect to the vessel, different shapes and lengths can
be achieved. Microneedles from a hundred microns up to two millimeters have been
obtained just tuning the radiation dose, by changing the exposure time (5-15 s)
and/or the power density (9-18 mW/cm²) during photolithography. Different
microneedle shapes, such as cylindrical, conic or lancet-like, for specific
applications such as micro-indentation or drug delivery, are demonstrated.